THE USE OF ION BOMBARDMENT IN DEPOSITION OF EVAPORATINC THIN METAL FILMS ON GLASS

doi:10.11835/j.issn.1674-4764.1995.03.017

Home > Archive>Volume 17, Issue 3, 1995 >108-110. DOI:10.11835/j.issn.1674-4764.1995.03.017

THE USE OF ION BOMBARDMENT IN DEPOSITION OF EVAPORATINC THIN METAL FILMS ON GLASS
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                        10.11835/j.issn.1674-4764.1995.03.017
                    
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Clc Number:TQ171.72
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Abstract:

This paper presents a new method in the producton of glass deposition byevaporation,and the principle of ion bonibardment.The effect of ion bombardment to the filmadhesion is estimated by the observation of cross-sectiun sweep electron micrcocope.

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程正勇.离子轰击在玻璃蒸发镀膜中的应用[J].土木与环境工程学报（中英文）,1995,17(3):108~110

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