Research on Error Automatic Revised Method of LSI Wafer Honing Process
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TN405 TN470.5

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    Abstract:

    A new automatic revised method of wafer profile error which uses CCD measuring error,sets up machining data base and carries out a wedge structure for stepless compensating error in honing process is described.Using this technology,a high precision LSI wafers can be obtained.

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郭隐彪 庄司克雄.集成电路基板研磨表面误差自动修正技术[J].重庆大学学报,1999,22(2):60~62

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