Preparation of V2O5 Semiconductor Thin Films From Induststrial V2O5

doi:10.11835/j.issn.1000-582X.2002.05.025

Home > Archive>Volume 25, Issue 5, 2002 >97-100. DOI:10.11835/j.issn.1000-582X.2002.05.025

Preparation of V2O5 Semiconductor Thin Films From Induststrial V2O5
DOI:
                        10.11835/j.issn.1000-582X.2002.05.025
                    
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Author:
                        YANG Shao li 1,XU Chu shao 1,CHEN Hou Sheng 2,HU Zai yong 1YANG Shao li 1,XU Chu shao 1,CHEN Hou Sheng 2,HU Zai yong 1

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杨绍利陈厚生等.工业五氧化二钒制备V2O5半导体薄膜分析[J].重庆大学学报,2002,25(5):97~100

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