CVD金刚石膜场发射机制的探讨
CSTR:
作者:
作者单位:

作者简介:

通讯作者:

中图分类号:

O484.4

基金项目:


Approach on the Mechanism of Electron Field Emission from CVD Diamond Films
Author:
Affiliation:

Fund Project:

  • 摘要
  • |
  • 图/表
  • |
  • 访问统计
  • |
  • 参考文献
  • |
  • 相似文献
  • |
  • 引证文献
  • |
  • 资源附件
  • |
  • 文章评论
    摘要:

    通过分析CVD金刚石膜的结构,对CVD金刚石膜的场发射机制进行了研究,结果表明金刚石膜内含有一定数量的石墨,当电子通过石墨时从石墨的电场中获得能量增大了电子隧穿金刚石晶粒的系数,据此提出了金刚石膜内石墨相增强电子隧穿金刚石颗粒以增强金刚石膜场电子发射的机制,并且根据该机制解释了一些实验现象。

    Abstract:

    The mechanism of electron field emission from CVD diamond films is investigated while analyzing its structure. The results indicate that there is some graphite in CVD diamond films and the coefficient which electrons tunneled through the diamond grains is enhanced because the electrons obtained energy from the electric field in graphite. Based on the results, a mechanism is put forward that enhancement of the electrons tunneled through diamond grains by graphite resulted in improvement electron emission from CVD diamond films. Some experimental results are well explained by the mechanism.

    参考文献
    相似文献
    引证文献
引用本文

王必本 王万录 等. CVD金刚石膜场发射机制的探讨[J].重庆大学学报,2001,24(4):145-149.

复制
分享
文章指标
  • 点击次数:
  • 下载次数:
  • HTML阅读次数:
  • 引用次数:
历史
  • 收稿日期:
  • 最后修改日期:2000-09-12
  • 录用日期:
  • 在线发布日期:
  • 出版日期:
文章二维码