为了提高WOx薄膜的电致变色性能,笔者采用磁控反应溅射工艺,以纯钨和纯钛为靶材在ITO玻璃上制备Ti掺杂WOx电致变色薄膜,用薄膜的透射光谱和XRD衍射方法对掺杂后薄膜的电致变色性能和结构进行了分析,研究了Ti掺杂对WOx薄膜电致变色性能和微观结构的影响机理.实验表明:Ti掺杂不会降低WOx薄膜的致色效果,还能显著提高薄膜的循环寿命,缩短响应时间,提高记忆存储能力,XRD分析表明,掺杂Ti之后的WOx薄膜仍为非晶态,且非晶态有增强的趋势.

Using pure tungsten and titanium as targets, Ti-doped WOx films were deposited on the ITO glass by Reactive Magnetron Sputtering in order to improve the electrochromic properties of WOx films . The electrochromic performances and structure of the films were analyzed by XRD and transmittance spectrum of the films. The influence mechanism of Ti doping on the electrochromic performances and structure of WOx films were studied. As demonstrated in the experiment, the mixed film is still in the amorphous state, and tends to be stronger. The cyclic life span and the ability of color storage can be significantly improved as well as the response time were shorted due to Ti cloning.

TB34

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