抑制碳化硅MOSFET阈值电压漂移的驱动电路
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作者单位:

重庆大学 输变电装备技术全国重点实验室,重庆 400044

作者简介:

赵柯(1998—),男,硕士研究生,主要从事碳化硅器件可靠性研究,(E-mail)202111021036@stu.cqu.edu.cn。

通讯作者:

蒋华平,男,研究员,博士生导师,(E-mail)Huaping.Jiang@cqu.edu.cn。

中图分类号:

TN 386

基金项目:


Driving circuit for suppressing threshold voltage drift in silicon carbide MOSFETs
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State Key Laboratory of Power Transmission Equipment Technology, Chongqing University, Chongqing 400044, P. R. China

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    摘要:

    碳化硅金属-氧化物-半导体场效应晶体管(metal-oxide-semiconductor field-effect transistor,MOSFET)的阈值电压漂移严重影响了其在应用中的可靠性。针对该问题,文中总结了碳化硅MOSFET阈值电压漂移的特点与现有的理论模型,提出抑制阈值电压漂移的驱动方法与驱动电路。该驱动电路通过引入中间电平的方式,将被控器件关断动态过程与关断稳态后的栅极电压区分开来,以此来达到降低碳化硅MOSFET的阈值电压漂移量的目的,同时还可以保留负栅极关断电压的优势。搭建了实验平台来验证该驱动电路对碳化硅MOSFET阈值电压漂移的抑制效果,结果表明,在文中的实验条件下该驱动电路相比于传统的驱动方式阈值电压漂移量降低了37%。

    Abstract:

    Threshold voltage drift in silicon carbide metal-oxide-semiconductor field-effect transistors (MOSFETs) poses a significant challenge to device reliability in practical applications. This paper reviews the characteristics and existing theoretical models of threshold voltage drift in silicon carbide MOSFETs and proposes a novel gate driving method and circuit to mitigate this issue. The proposed circuit differentiates the device’s turn-off dynamic process from the post turn-off gate voltage by introducing an intermediate voltage level, thereby effectively suppressing threshold voltage drift while retaining the benefits of a negative gate turn-off voltage. An experimental platform was constructed to evaluate the proposed driving circuit. Experimental results indicate that, under the specified conditions, the new circuit reduces threshold voltage drift by 37% compared to conventional driving methods.

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引用本文

赵柯,蒋华平,汤磊,钟笑寒,谢宇庭,胡浩伟,肖念磊,黄诣涵,刘立.抑制碳化硅MOSFET阈值电压漂移的驱动电路[J].重庆大学学报,2025,48(9):50-56.

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  • 收稿日期:2023-10-05
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  • 在线发布日期: 2025-10-13
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